sewing | hand dyeing | digital printing on textile | digital fabrication
Pique is a line that aims to blur the boundaries between sculpture and
ready- to- wear. Although consumers often buy practical clothing, they are more inspired by elaborate fashion. This collection uses geometric shapes and lines of color to emphasize design, architecture, and structural shadows.
Each look is designed in response to material capabilities and highlights tactility and texture in unconventional applications. Pique is a collection designed to challenge how traditional garments are built around and for the body.
MICA's Annual Benefit Fashion Show: HUEMAN SS17
Photographer: Jonathan Chen and Andrew Copeland
Makeup: Kiley Mcartney and Shadi Jahelka
Models: Shannon Dagon, Shadi Jahelka, Mac Kauffman, Justine Kim, Robin Krupnick, Cathy Lin, Callee McCosby, Rachel Rusk